Metal-insulator transition in stressed Si:B.
Item
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Title
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Metal-insulator transition in stressed Si:B.
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Identifier
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AAI9820512
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identifier
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9820512
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Creator
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Bogdanovich, Snezana.
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Contributor
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Adviser: Myriam P. Sarachik
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Date
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1998
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Language
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English
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Publisher
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City University of New York.
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Subject
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Physics, Condensed Matter | Engineering, Electronics and Electrical
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Abstract
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This manuscript contains three chapters: (i) Chapter I contains a review of the theory of metal-insulator transitions in doped semiconductors and a review of the scaling theory of localization and its results. (ii) Chapter II contains experimental data on the magnetoconductance of metallic Si:B. It will be shown that the conductivity data for Si:B with dopant concentrations {dollar}\rm 1.01n\sb{lcub}c{rcub} < n <1.22n\sb{lcub}c{rcub}{dollar} obey universal scaling of the form expected for electron-electron interactions for a large range of magnetic fields and temperatures. The existence of this scaling implies that the metal-insulator transition is dominated by interactions. Detailed analysis of the data show that the localization, spin-orbit and spin-flip interactions do not play an important role in transport processes in this material. (iii) Chapter III contains experimental data on the stress-tuned metal-insulator transition in Si:B. Uniaxial stress drives a metallic sample into the insulating phase by decreasing the impurity wavefunction overlap and increasing the value of the critical concentration {dollar}\rm n\sb{lcub}c{rcub}.{dollar} The conductivity obeys dynamical scaling as a function of temperature and stress near the critical point in both metallic and insulating phases. Important findings are: (a) The approach to the transition by variation of stress and variation of the dopant concentration are very different. (b) The critical conductivity has a {dollar}\rm T\sp{lcub}1/2{rcub}{dollar} behavior similar to the conductivity outside the critical region due to electron-electron interactions. (c) The conductivity of the insulator obeys Efros-Shklovskii hopping due to electron-electron interactions {dollar}\rm\sigma\sim T\sp{lcub}1/2{rcub}exp\lbrack {lcub}-{rcub}\rm (T\sb0/T)\sp{lcub}1/2{rcub}\rbrack {dollar} with a temperature dependent prefactor {dollar}\rm\propto\ T\sp{lcub}1/2{rcub}.{dollar}.
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Type
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dissertation
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Source
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PQT Legacy CUNY.xlsx
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degree
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Ph.D.